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    Diffusion models of BF2+ and B+ implanted at low-energy in crystalline silicon

    New search for: Marcon, J.
    New search for: Coq, L. I.
    New search for: Masmoudi, K.
    New search for: Ketata, K.

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    Diffusion models of BF2+ and B+ implanted at low-energy in crystalline silicon

    New search for: Marcon, J.
    New search for: Coq, L. I.
    New search for: Masmoudi, K.
    New search for: Ketata, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Diffusion models of BF2+ and B+ implanted at low-energy in crystalline silicon

    New search for: Marcon, J.
    New search for: Coq, L. I.
    New search for: Masmoudi, K.
    New search for: Ketata, K.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Diffusion models of BF2+ and B+ implanted at low-energy in crystalline silicon

    Contributors:

    Marcon, J. (author) / Coq, L. I. (author) / Masmoudi, K. (author) / Ketata, K. (author)

    Published in:

    MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 114/115 ; 339-344

    Publication date:

    2004-01-01

    Size:

    6 pages

    ISSN:

    0921-5107

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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