p-type conduction in ion-implanted amorphized Ge

Romano, L. / Impellizzeri, G. / Grimaldi, M. G. | British Library Online Contents | 2012

Recrystallization of Amorphized alpha -TCP

Dobelin, N. / Galea, L. / Eggenberger, U. et al. | British Library Online Contents | 2012

Phosphorus and boron doping effects on solid phase recrystallization of polycrystalline silicon films amorphized by germanium ion implantation

Kang, M.-Y. / Yamamoto, T. / Matsui, T. et al. | British Library Online Contents | 1996

An investigation on the modeling of boron-enhanced diffusion of ultralow energy implanted boron in silicon

Marcon, J. / Ihaddadene-Le Coq, L. / Masmoudi, K. et al. | British Library Online Contents | 2005

Modeling of the transient enhanced diffusion of boron implanted into preamorphized silicon: the case of BF2+ implantation

Dusch, A. / Marcon, J. / Masmoudi, K. et al. | British Library Online Contents | 2001