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400degreeC Formation of poly-SiGe on SiO2 by Au-induced lateral crystallization
400degreeC Formation of poly-SiGe on SiO2 by Au-induced lateral crystallization
400degreeC Formation of poly-SiGe on SiO2 by Au-induced lateral crystallization
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 8 ; 79-82
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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