Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Synchrotron radiation stimulated etching SiO2 thin films with a contact cobalt mask
APPLIED SURFACE SCIENCE ; 242 ; 276-280
01.01.2005
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 1999
|Synchrotron-radiation-excited etching of SiC
British Library Online Contents | 1994
|Deposition of Teflon-polymer thin films by synchrotron radiation photodecomposition
British Library Online Contents | 1999
|British Library Online Contents | 2002
|Mechanisms of synchrotron radiation-excited etching reactions of semiconductor materials
British Library Online Contents | 1993
|