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Synchrotron radiation stimulated etching SiO2 thin films with a contact cobalt mask

Wang, C. / Urisu, T.

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Synchrotron radiation stimulated etching SiO2 thin films with a contact cobalt mask

Wang, C. / Urisu, T.

Synchrotron radiation stimulated etching SiO2 thin films with a contact cobalt mask

Wang, C. / Urisu, T.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Synchrotron radiation stimulated etching SiO2 thin films with a contact cobalt mask

Contributors:

Wang, C. (author) / Urisu, T. (author)

Published in:

APPLIED SURFACE SCIENCE ; 242 ; 276-280

Publication date:

2005-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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