Study of HfO2 thin films prepared by electron beam evaporation

Wang, Y. / Lin, Z. / Cheng, X. et al. | British Library Online Contents | 2004

Influence of ZrO2 in HfO2 on reflectance of HfO2/SiO2 multilayer at 248nm prepared by electron-beam evaporation

Yuan, J. / Yuan, L. / He, H. et al. | British Library Online Contents | 2008

Y2O3 stabilized ZrO2 thin films deposited by electron beam evaporation: Structural, morphological characterization and laser induced damage threshold

Wu, S. G. / Zhang, H. Y. / Tian, G. L. et al. | British Library Online Contents | 2006

Influence of oxygen post-treatment on laser-induced damage of antireflection coatings prepared by electron-beam evaporation and ion beam assisted deposition

Yuan, L. / Wang, C. / Zhao, Y. et al. | British Library Online Contents | 2008

Influence of negative ion element impurities on laser induced damage threshold of HfO2 thin film

Wu, S. / Tian, G. / Xia, Z. et al. | British Library Online Contents | 2006