Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Ion Beam Analysis and Computer Simulation of Damage Accumulation in Nitrogen Implanted 6H-SiC: Effects of Channeling
Ion Beam Analysis and Computer Simulation of Damage Accumulation in Nitrogen Implanted 6H-SiC: Effects of Channeling
Ion Beam Analysis and Computer Simulation of Damage Accumulation in Nitrogen Implanted 6H-SiC: Effects of Channeling
Zolnai, Z. (Autor:in) / Ster, A. (Autor:in) / Khanh, N. Q. (Autor:in) / Kotai, E. (Autor:in) / Posselt, M. (Autor:in) / Battistig, G. (Autor:in) / Lohner, T. (Autor:in) / Gyulai, J. (Autor:in) / Nipoti, R. / Poggi, A.
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Studies of Damage Accumulation in 4H Silicon Carbide by Ion-Channeling Techniques
British Library Online Contents | 2005
|RBS-Channeling and EPR Studies of Damage in 2 MeV Al^2^+-Implanted 6H-SiC Substrates
British Library Online Contents | 2005
|Damage Distributions Induced by Channeling Implantation of Nitrogen into 6H Silicon Carbide
British Library Online Contents | 2003
|Rutherford backscattering/channeling study of the implanted MeV Au^+ in silicon
British Library Online Contents | 1999
|Damage channeling in femtosecond laser micro-structured SBN crystals
British Library Online Contents | 2008
|