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Rutherford backscattering/channeling study of the implanted MeV Au^+ in silicon
Rutherford backscattering/channeling study of the implanted MeV Au^+ in silicon
Rutherford backscattering/channeling study of the implanted MeV Au^+ in silicon
Wang, K.-M. (Autor:in) / Meng, M.-Q. (Autor:in) / Lu, F. (Autor:in) / Shi, B.-R. (Autor:in) / Wang, F.-X. (Autor:in) / Li, W. (Autor:in) / Shen, D.-Y. (Autor:in) / Wang, X.-M. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 57 ; 92-96
01.01.1999
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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