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Residual Stress Measurement in Sputtered Copper Thin Films by Synchrotron Radiation and Ordinary X-Rays
Residual Stress Measurement in Sputtered Copper Thin Films by Synchrotron Radiation and Ordinary X-Rays
Residual Stress Measurement in Sputtered Copper Thin Films by Synchrotron Radiation and Ordinary X-Rays
Hataya, M. (Autor:in) / Hanabusa, T. (Autor:in) / Kusaka, K. (Autor:in) / Tominaga, K. (Autor:in) / Matsue, T. (Autor:in) / Sakata, O. (Autor:in) / Denis, S. / Hanabusa, T. / He, B. / Mittemeijer, E.
01.01.2005
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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