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Residual Stress in Thin Films of RF-Sputtered Aluminum by X-Ray Multiaxial Stress Measurement
Residual Stress in Thin Films of RF-Sputtered Aluminum by X-Ray Multiaxial Stress Measurement
Residual Stress in Thin Films of RF-Sputtered Aluminum by X-Ray Multiaxial Stress Measurement
Ejiri, S. (Autor:in) / Lin, Z. (Autor:in) / Sasaki, T. (Autor:in) / Hirose, Y. (Autor:in)
ADVANCES IN X RAY ANALYSIS ; 433-438
01.01.1997
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
539.7222
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