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Evaluation of residual stress in sputtered tantalum thin-film
Evaluation of residual stress in sputtered tantalum thin-film
Evaluation of residual stress in sputtered tantalum thin-film
Al-masha'al, Asa'ad (Autor:in) / Bunting, Andrew (Autor:in) / Cheung, Rebecca (Autor:in)
Applied surface science ; 371 ; 571-575
01.01.2016
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
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