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An investigation on the modeling of boron-enhanced diffusion of ultralow energy implanted boron in silicon
An investigation on the modeling of boron-enhanced diffusion of ultralow energy implanted boron in silicon
An investigation on the modeling of boron-enhanced diffusion of ultralow energy implanted boron in silicon
Marcon, J. (Autor:in) / Ihaddadene-Le Coq, L. (Autor:in) / Masmoudi, K. (Autor:in) / Ketata, K. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B -LAUSANNE- ; 124-125 ; 415-418
01.01.2005
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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