Suppression of boron transient enhanced diffusion in silicon and silicon germanium by fluorine implantation

El Mubarek, H. A. / Wang, Y. / Price, R. et al. | British Library Online Contents | 2005

An investigation on the modeling of boron-enhanced diffusion of ultralow energy implanted boron in silicon

Marcon, J. / Ihaddadene-Le Coq, L. / Masmoudi, K. et al. | British Library Online Contents | 2005

Recrystallization of boron-doped and undoped preamorphized silicon layers by rapid and conventional thermal annealing

Faure, J. / Claverie, A. / Laanab, L. et al. | British Library Online Contents | 1994

Diffusion of ion-implanted boron impurities into pre-amorphized silicon

Ohno, N. / Hara, T. / Matsunaga, Y. et al. | British Library Online Contents | 2000

Characterization of a Thermal Oxidation Process on SiC Preamorphized by Ar Ion Implantation

Poggi, A. / Nipoti, R. / Solmi, S. et al. | British Library Online Contents | 2004