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Characteristics of sandwich-structured Al2O3/HfO2/Al2O3 gate dielectric films on ultra-thin silicon-on-insulator substrates
Characteristics of sandwich-structured Al2O3/HfO2/Al2O3 gate dielectric films on ultra-thin silicon-on-insulator substrates
Characteristics of sandwich-structured Al2O3/HfO2/Al2O3 gate dielectric films on ultra-thin silicon-on-insulator substrates
APPLIED SURFACE SCIENCE ; 252 ; 1876-1882
01.01.2005
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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