Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Effects of Suspending Abrasives on the Lubrication Properties of Slurry in Chemical Mechanical Polishing of Silicon Wafer
Effects of Suspending Abrasives on the Lubrication Properties of Slurry in Chemical Mechanical Polishing of Silicon Wafer
Effects of Suspending Abrasives on the Lubrication Properties of Slurry in Chemical Mechanical Polishing of Silicon Wafer
Liu, J. Y. (Autor:in) / Jin, Z. J. (Autor:in) / Guo, D. M. (Autor:in) / Kang, R. K. (Autor:in)
KEY ENGINEERING MATERIALS ; 304/305 ; 359-363
01.01.2006
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2006
|Effects of mixed abrasives in chemical mechanical polishing of oxide films
British Library Online Contents | 2003
|Chemical-mechanical polishing of copper and tantalum with silica abrasives
British Library Online Contents | 2001
|Chemical-Mechanical Polishing of Wafers with Copper Film by Nano-Scale Abrasives
British Library Online Contents | 2008
|