Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Electrophysical properties and distribution profiles of manganese ions implanted in silicon
Electrophysical properties and distribution profiles of manganese ions implanted in silicon
Electrophysical properties and distribution profiles of manganese ions implanted in silicon
Egamberdiev, B. E. (Autor:in) / Kholliev, B. C. (Autor:in) / Mallaev, A. S. (Autor:in)
01.01.2005
3 pages
Aufsatz (Zeitschrift)
Englisch
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Magnetic properties of silicon crystals implanted with manganese
British Library Online Contents | 2008
|Diffusion profiles of low dosages chromium ions implanted into (100) crystalline silicon
British Library Online Contents | 2006
|Range profiles of 6-10 MeV ^1^5N ions implanted in silicon
British Library Online Contents | 1995
|The Range Distribution of Er Ions Implanted in Silicon Crystal
British Library Online Contents | 2011
|Electrophysical and Optical Properties of 4H-SiC Irradiated with Xe Ions
British Library Online Contents | 2013
|