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    Electrophysical properties and distribution profiles of manganese ions implanted in silicon

    New search for: Egamberdiev, B. E.
    New search for: Kholliev, B. C.
    New search for: Mallaev, A. S.

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    Electrophysical properties and distribution profiles of manganese ions implanted in silicon

    New search for: Egamberdiev, B. E.
    New search for: Kholliev, B. C.
    New search for: Mallaev, A. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electrophysical properties and distribution profiles of manganese ions implanted in silicon

    New search for: Egamberdiev, B. E.
    New search for: Kholliev, B. C.
    New search for: Mallaev, A. S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

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    Document information
    Title:

    Electrophysical properties and distribution profiles of manganese ions implanted in silicon

    Contributors:

    Egamberdiev, B. E. (author) / Kholliev, B. C. (author) / Mallaev, A. S. (author)

    Published in:

    SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY C/C OF ELEKTRONNAIA OBRABOTKA MATERIALOV ; 82-84

    Publication date:

    2005-01-01

    Size:

    3 pages

    ISSN:

    1068-3755

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44 / 660.297

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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