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Electrical properties of La2O3 thin films grown on TiN/Si substrates via atomic layer deposition
Electrical properties of La2O3 thin films grown on TiN/Si substrates via atomic layer deposition
Electrical properties of La2O3 thin films grown on TiN/Si substrates via atomic layer deposition
Park, N. K. (Autor:in) / Kang, D. K. (Autor:in) / Kim, B. H. (Autor:in) / Jo, S. J. (Autor:in) / Ha, J. S. (Autor:in)
APPLIED SURFACE SCIENCE ; 252 ; 8506-8509
01.01.2006
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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