Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Surface roughening and erosion rate change at low energy SIMS depth profiling of silicon during oblique Formula Not Shown bombardment
Surface roughening and erosion rate change at low energy SIMS depth profiling of silicon during oblique Formula Not Shown bombardment
Surface roughening and erosion rate change at low energy SIMS depth profiling of silicon during oblique Formula Not Shown bombardment
Fares, B. (Autor:in) / Gautier, B. (Autor:in) / Holliger, P. (Autor:in) / Baboux, N. (Autor:in) / Prudon, G. (Autor:in) / Dupuy, J. C. (Autor:in)
APPLIED SURFACE SCIENCE ; 253 ; 2662-2670
01.01.2006
9 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Surface roughening effect in sub-keV SIMS depth profiling
British Library Online Contents | 2003
|Depth profiling using C60+ SIMS-Deposition and topography development during bombardment of silicon
British Library Online Contents | 2006
|Surface roughening of silicon under ultra-low-energy cesium bombardment
British Library Online Contents | 2003
|Apparent and real transient effects in SIMS depth profiling using oxygen bombardment
British Library Online Contents | 2003
|Cesium redeposition artifacts during low energy ToF-SIMS depth profiling
British Library Online Contents | 2009
|