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Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target
Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target
Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target
Abe, Y. (Autor:in) / Ishiyama, N. (Autor:in)
JOURNAL OF MATERIALS SCIENCE ; 41 ; 7580-7584
01.01.2006
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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