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Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target

Abe, Y. / Ishiyama, N.

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Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target

Abe, Y. / Ishiyama, N.

Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target

Abe, Y. / Ishiyama, N.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target

Contributors:

Abe, Y. (author) / Ishiyama, N. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 41 ; 7580-7584

Publication date:

2006-01-01

Size:

5 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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