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Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target
Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target
Titanium-doped indium oxide films prepared by d.c. magnetron sputtering using ceramic target
Abe, Y. (author) / Ishiyama, N. (author)
JOURNAL OF MATERIALS SCIENCE ; 41 ; 7580-7584
2006-01-01
5 pages
Article (Journal)
English
DDC:
620.11
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