Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Germanium: From the first application of Czochralski crystal growth to large diameter dislocation-free wafers
Germanium: From the first application of Czochralski crystal growth to large diameter dislocation-free wafers
Germanium: From the first application of Czochralski crystal growth to large diameter dislocation-free wafers
Depuydt, B. (Autor:in) / Theuwis, A. (Autor:in) / Romandic, I. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 437-443
01.01.2006
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Effect of light germanium doping on thermal donors in Czochralski silicon wafers
British Library Online Contents | 2006
|The first large diameter crystal growth furnace
British Library Online Contents | 1997
Comparison of high temperature annealed Czochralski silicon wafers and epitaxial wafers
British Library Online Contents | 1996
|British Library Online Contents | 2007
|British Library Online Contents | 2006
|