A platform for research: civil engineering, architecture and urbanism
Germanium: From the first application of Czochralski crystal growth to large diameter dislocation-free wafers
Germanium: From the first application of Czochralski crystal growth to large diameter dislocation-free wafers
Germanium: From the first application of Czochralski crystal growth to large diameter dislocation-free wafers
Depuydt, B. (author) / Theuwis, A. (author) / Romandic, I. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 9 ; 437-443
2006-01-01
7 pages
Article (Journal)
English
DDC:
621.38152
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Effect of light germanium doping on thermal donors in Czochralski silicon wafers
British Library Online Contents | 2006
|The first large diameter crystal growth furnace
British Library Online Contents | 1997
Comparison of high temperature annealed Czochralski silicon wafers and epitaxial wafers
British Library Online Contents | 1996
|British Library Online Contents | 2007
|British Library Online Contents | 2006
|