Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Investigation of processing parameters for pulsed closed field unbalanced magnetron sputtered titanium carbide thin films
Investigation of processing parameters for pulsed closed field unbalanced magnetron sputtered titanium carbide thin films
Investigation of processing parameters for pulsed closed field unbalanced magnetron sputtered titanium carbide thin films
Anton, J. M. (Autor:in) / Mishra, B. (Autor:in) / Moore, J. J. (Autor:in)
SURFACE ENGINEERING -LONDON- ; 23 ; 23-27
01.01.2007
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.44
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Pulsed Closed Field Unbalanced Magnetron Sputtering (P-CFUBMS) Deposited TiC/a:C Thin Films
British Library Online Contents | 2007
|British Library Online Contents | 2007
|Carbon nitride based hard multilayer films prepared by closed field unbalanced magnetron sputtering
British Library Online Contents | 2006
|Surface free energy of CrNx films deposited using closed field unbalanced magnetron sputtering
British Library Online Contents | 2006
|Corrosion of thin, magnetron sputtered Nb2O5 films
British Library Online Contents | 2016
|