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    Investigation of processing parameters for pulsed closed field unbalanced magnetron sputtered titanium carbide thin films

    New search for: Anton, J. M.
    New search for: Mishra, B.
    New search for: Moore, J. J.

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    Investigation of processing parameters for pulsed closed field unbalanced magnetron sputtered titanium carbide thin films

    New search for: Anton, J. M.
    New search for: Mishra, B.
    New search for: Moore, J. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Investigation of processing parameters for pulsed closed field unbalanced magnetron sputtered titanium carbide thin films

    New search for: Anton, J. M.
    New search for: Mishra, B.
    New search for: Moore, J. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Investigation of processing parameters for pulsed closed field unbalanced magnetron sputtered titanium carbide thin films

    Contributors:

    Anton, J. M. (author) / Mishra, B. (author) / Moore, J. J. (author)

    Published in:

    SURFACE ENGINEERING -LONDON- ; 23 ; 23-27

    Publication date:

    2007-01-01

    Size:

    5 pages

    ISSN:

    0267-0844

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.44

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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