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Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods
Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods
Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods
Egamberdiev, B. E. (Autor:in) / Holliev, B. C. (Autor:in) / Mallaev, A. S. (Autor:in) / Zoirova, M. E. (Autor:in) / Eshonkhonov, A. (Autor:in)
01.01.2007
5 pages
Aufsatz (Zeitschrift)
Englisch
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