Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods: Fid-Bau Portal

Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods

Egamberdiev, B. E. / Holliev, B. C. / Mallaev, A. S. / Zoirova, M. E. / Eshonkhonov, A.

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Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods

Egamberdiev, B. E. / Holliev, B. C. / Mallaev, A. S. / Zoirova, M. E. / Eshonkhonov, A.

Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods

Egamberdiev, B. E. / Holliev, B. C. / Mallaev, A. S. / Zoirova, M. E. / Eshonkhonov, A.

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Order at Subito €

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Title:

Obtaining films of CoSi2/Si (100) and the analysis of their morphology and stoichiometry through molecular-beam, solid-phase and reactive epitaxy methods

Contributors:

Egamberdiev, B. E. (author) / Holliev, B. C. (author) / Mallaev, A. S. (author) / Zoirova, M. E. (author) / Eshonkhonov, A. (author)

Published in:

SURFACE ENGINEERING AND APPLIED ELECTROCHEMISTRY C/C OF ELEKTRONNAIA OBRABOTKA MATERIALOV ; 43 ; 72-76

Publication date:

2007-01-01

Size:

5 pages

ISSN:

1068-3755

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.44 / 660.297

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