Etch damage evaluation of low-angle, forward-reflected neutral beam etching

Lee, D. H. / Chung, M. J. / Hwang, H. K. et al. | British Library Online Contents | 2003

Anisotropic ECR Plasma Etching with Low-Energy Ions

Tobinaga, Y. / Miyano, T. / Fujimoto, K. et al. | British Library Online Contents | 1993

Etching of CVD diamond films using oxygen ions in ECR plasma

Ma, Z. / Wu, J. / Shen, W. et al. | British Library Online Contents | 2014

Surface chemistry associated with plasma etching processes

Graves, D. B. / Humbird, D. | British Library Online Contents | 2002

Optimization of inductively coupled plasma deep etching of GaN and etching damage analysis

Qiu, R. / Lu, H. / Chen, D. et al. | British Library Online Contents | 2011