Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Optimization of inductively coupled plasma deep etching of GaN and etching damage analysis
Optimization of inductively coupled plasma deep etching of GaN and etching damage analysis
Optimization of inductively coupled plasma deep etching of GaN and etching damage analysis
APPLIED SURFACE SCIENCE ; 257 ; 2700-2706
01.01.2011
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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