Ultrastructural organization of premature condensed chromosomes at S-phase as observed by atomic force microscopy

Yihui, F. / Xiaohong, Z. / Jing, B. et al. | British Library Online Contents | 2007

Vertical SiGe-based silicon-on-nothing (SON) technology for sub-30nm MOS devices

Thompson, P. E. / Jernigan, G. / Schulze, J. et al. | British Library Online Contents | 2005

Sub-50nm gate length SOI transistor development for high performance microprocessors

Horstmann, M. / Greenlaw, D. / Feudel, T. et al. | British Library Online Contents | 2004

LITHOGRAPHY - Using phase shifting to extend 248nm litho beyond the 50nm gate process - 248nm lithography can be used down to the 100nm node using a dark-field AltPSM double-exposure process, but can it print gates below 50nm?

Fang, C.Y. | Online Contents | 2003

Sol-gel synthesis of sub-50nm ZnO nanowires on pulse laser deposited ZnO thin films

Bae, C. H. / Park, S. M. / Ahn, S. E. et al. | British Library Online Contents | 2006