Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
On temperature coefficient of resistance of boron-doped SiGe films deposited by sputtering
On temperature coefficient of resistance of boron-doped SiGe films deposited by sputtering
On temperature coefficient of resistance of boron-doped SiGe films deposited by sputtering
Jelenkovic, E. V. (Autor:in) / Jevtic, M. M. (Autor:in) / Tong, K. Y. (Autor:in) / Pang, G. K. (Autor:in) / Cheung, W. Y. (Autor:in) / Jha, S. K. (Autor:in)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 10 ; 143-149
01.01.2007
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.38152
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