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On temperature coefficient of resistance of boron-doped SiGe films deposited by sputtering
On temperature coefficient of resistance of boron-doped SiGe films deposited by sputtering
On temperature coefficient of resistance of boron-doped SiGe films deposited by sputtering
Jelenkovic, E. V. (author) / Jevtic, M. M. (author) / Tong, K. Y. (author) / Pang, G. K. (author) / Cheung, W. Y. (author) / Jha, S. K. (author)
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 10 ; 143-149
2007-01-01
7 pages
Article (Journal)
English
DDC:
621.38152
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