Two-Dimensional Patterning of Flexible Designs with High Half-Pitch Resolution by Using Block Copolymer Lithography: Fid-Bau Portal

Two-Dimensional Patterning of Flexible Designs with High Half-Pitch Resolution by Using Block Copolymer Lithography

Yamaguchi, T. / Yamaguchi, H.

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Two-Dimensional Patterning of Flexible Designs with High Half-Pitch Resolution by Using Block Copolymer Lithography

Yamaguchi, T. / Yamaguchi, H.

Two-Dimensional Patterning of Flexible Designs with High Half-Pitch Resolution by Using Block Copolymer Lithography

Yamaguchi, T. / Yamaguchi, H.

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

Seitennavigation

Dokumentinformationen

Ähnliche Titel

Exportieren, teilen und zitieren

Dokumentinformationen

Titel:

Two-Dimensional Patterning of Flexible Designs with High Half-Pitch Resolution by Using Block Copolymer Lithography

Beteiligte:

Yamaguchi, T. (Autor:in) / Yamaguchi, H. (Autor:in)

Erschienen in:

ADVANCED MATERIALS -DEERFIELD BEACH THEN WEINHEIM- ; 20 ; 1684-1689

Erscheinungsdatum:

01.01.2008

Format / Umfang:

6 pages

ISSN:

0935-9648

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 620.11

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Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning

Yi, H. / Bao, X. Y. / Zhang, J. et al. | British Library Online Contents | 2012

Resolution Limit in Plasmonic Lithography for Practical Applications beyond 2x-nm Half Pitch

Kim, S. / Jung, H. / Kim, Y. et al. | British Library Online Contents | 2012

Template Patterning: Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning (Adv. Mater. 23/2012)

Yi, H. / Bao, X. Y. / Zhang, J. et al. | British Library Online Contents | 2012

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