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Influence of Boron-doping on Electrical Properties of na-Si:H Thin Film Prepared by PECVD
Influence of Boron-doping on Electrical Properties of na-Si:H Thin Film Prepared by PECVD
Influence of Boron-doping on Electrical Properties of na-Si:H Thin Film Prepared by PECVD
Feng, R.-h. (Autor:in) / Zhang, X.-w. (Autor:in) / Han, G.-r. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING -HANGZHOU- ; 26 ; 226-228
01.01.2008
3 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
620.11
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