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The effects of plasma treatment on the thermal stability of HfO2 thin films
The effects of plasma treatment on the thermal stability of HfO2 thin films
The effects of plasma treatment on the thermal stability of HfO2 thin films
Chang, K. M. (Autor:in) / Chen, B. N. (Autor:in) / Huang, S. M. (Autor:in)
APPLIED SURFACE SCIENCE ; 254 ; 6116-6118
01.01.2008
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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