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The effects of plasma treatment on the thermal stability of HfO2 thin films

Chang, K. M. / Chen, B. N. / Huang, S. M.

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The effects of plasma treatment on the thermal stability of HfO2 thin films

Chang, K. M. / Chen, B. N. / Huang, S. M.

The effects of plasma treatment on the thermal stability of HfO2 thin films

Chang, K. M. / Chen, B. N. / Huang, S. M.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

The effects of plasma treatment on the thermal stability of HfO2 thin films

Contributors:

Chang, K. M. (author) / Chen, B. N. (author) / Huang, S. M. (author)

Published in:

APPLIED SURFACE SCIENCE ; 254 ; 6116-6118

Publication date:

2008-01-01

Size:

3 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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