Deposition of AlN and Oxidized AlN Thin-Films by Reactive Sputtering: Correlation Between Film Growth and Deposition Parameters: Fid-Bau Portal

Deposition of AlN and Oxidized AlN Thin-Films by Reactive Sputtering: Correlation Between Film Growth and Deposition Parameters

Garcia-Mendez, M. / Morales-Rodriguez, S. / Ramirez, L.E. / Perez-Tijerina, E.G.

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Deposition of AlN and Oxidized AlN Thin-Films by Reactive Sputtering: Correlation Between Film Growth and Deposition Parameters

Garcia-Mendez, M. / Morales-Rodriguez, S. / Ramirez, L.E. / Perez-Tijerina, E.G.

Deposition of AlN and Oxidized AlN Thin-Films by Reactive Sputtering: Correlation Between Film Growth and Deposition Parameters

Garcia-Mendez, M. / Morales-Rodriguez, S. / Ramirez, L.E. / Perez-Tijerina, E.G.

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Titel:

Deposition of AlN and Oxidized AlN Thin-Films by Reactive Sputtering: Correlation Between Film Growth and Deposition Parameters

Beteiligte:

Garcia-Mendez, M. (Autor:in) / Morales-Rodriguez, S. (Autor:in) / Ramirez, L.E. (Autor:in) / Perez-Tijerina, E.G. (Autor:in)

Erschienen in:

SURFACE REVIEW AND LETTERS ; 15 ; 453-458

Erscheinungsdatum:

01.01.2008

Format / Umfang:

6 pages

ISSN:

0218-625X

Medientyp:

Aufsatz (Zeitschrift)

Format:

Sprache:

Englisch

Klassifikation:

DDC: 530.417

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