Deposition of AlN and Oxidized AlN Thin-Films by Reactive Sputtering: Correlation Between Film Growth and Deposition Parameters: Fid-Bau Portal

Deposition of AlN and Oxidized AlN Thin-Films by Reactive Sputtering: Correlation Between Film Growth and Deposition Parameters

Garcia-Mendez, M. / Morales-Rodriguez, S. / Ramirez, L.E. / Perez-Tijerina, E.G.

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Deposition of AlN and Oxidized AlN Thin-Films by Reactive Sputtering: Correlation Between Film Growth and Deposition Parameters

Garcia-Mendez, M. / Morales-Rodriguez, S. / Ramirez, L.E. / Perez-Tijerina, E.G.

Deposition of AlN and Oxidized AlN Thin-Films by Reactive Sputtering: Correlation Between Film Growth and Deposition Parameters

Garcia-Mendez, M. / Morales-Rodriguez, S. / Ramirez, L.E. / Perez-Tijerina, E.G.

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Check availability in my library

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Document information

Title:

Deposition of AlN and Oxidized AlN Thin-Films by Reactive Sputtering: Correlation Between Film Growth and Deposition Parameters

Contributors:

Garcia-Mendez, M. (author) / Morales-Rodriguez, S. (author) / Ramirez, L.E. (author) / Perez-Tijerina, E.G. (author)

Published in:

SURFACE REVIEW AND LETTERS ; 15 ; 453-458

Publication date:

2008-01-01

Size:

6 pages

ISSN:

0218-625X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 530.417

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