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Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Wang, Q. / Wang, C. / Wang, Z. / Zhang, J. / He, D.

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Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Wang, Q. / Wang, C. / Wang, Z. / Zhang, J. / He, D.

Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Wang, Q. / Wang, C. / Wang, Z. / Zhang, J. / He, D.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Stress relief patterns of hydrogenated amorphous carbon films grown by dc-pulse plasma chemical vapor deposition

Contributors:

Wang, Q. (author) / Wang, C. (author) / Wang, Z. (author) / Zhang, J. (author) / He, D. (author)

Published in:

APPLIED SURFACE SCIENCE ; 255 ; 1836-1840

Publication date:

2008-01-01

Size:

5 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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