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Modifying the properties of fluorinated amorphous films using argon by filtered cathodic vacuum arc
Modifying the properties of fluorinated amorphous films using argon by filtered cathodic vacuum arc
Modifying the properties of fluorinated amorphous films using argon by filtered cathodic vacuum arc
Lin, Y. H. (Autor:in) / Syue, Y. C. (Autor:in) / Lin, H. D. (Autor:in) / Chen, U. S. (Autor:in) / Chang, Y. S. (Autor:in) / Chen, J. R. (Autor:in) / Shih, H. C. (Autor:in)
APPLIED SURFACE SCIENCE ; 255 ; 2139-2142
01.01.2008
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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