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Elimination of surface scratch/texture on the surface of single crystal Si substrate in chemo-mechanical grinding (CMG) process
Elimination of surface scratch/texture on the surface of single crystal Si substrate in chemo-mechanical grinding (CMG) process
Elimination of surface scratch/texture on the surface of single crystal Si substrate in chemo-mechanical grinding (CMG) process
Tian, Y. B. (Autor:in) / Zhou, L. (Autor:in) / Shimizu, J. (Autor:in) / Tashiro, Y. (Autor:in) / Kang, R. K. (Autor:in)
APPLIED SURFACE SCIENCE ; 255 ; 4205-4211
01.01.2009
7 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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