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Characterization of a-C:H Thin Films Deposited from C~2H~4 by PECVD Microwave Discharge
Characterization of a-C:H Thin Films Deposited from C~2H~4 by PECVD Microwave Discharge
Characterization of a-C:H Thin Films Deposited from C~2H~4 by PECVD Microwave Discharge
Kihel, M. (Autor:in) / Clergeraux, R. (Autor:in) / Sahli, S. (Autor:in) / Escaich, D. (Autor:in) / Segui, Y. (Autor:in) / Raynaud, P. (Autor:in) / Gabouze, N.
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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