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Electrically active defects in erbium-implanted silicon: Effects of annealing under high hydrostatic pressures and electron irradiation
Electrically active defects in erbium-implanted silicon: Effects of annealing under high hydrostatic pressures and electron irradiation
Electrically active defects in erbium-implanted silicon: Effects of annealing under high hydrostatic pressures and electron irradiation
Emtsev, V. V. (Autor:in) / Kozlovskii, V. V. (Autor:in) / Misiuk, A. (Autor:in) / Oganesyan, G. A. (Autor:in) / Poloskin, D. S. (Autor:in) / Sobolev, N. A. (Autor:in) / Tropp, E. A. (Autor:in)
MATERIALS SCIENCE AND ENGINEERING B ADVANCED FUNCTIONAL SOLID STATE MATERIALS ; 159-160 ; 157-159
01.01.2009
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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