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High-Efficient Damage-Free Correction of the Thickness Distribution of Quartz Crystal Wafer Using Open-Air Type Plasma CVM
High-Efficient Damage-Free Correction of the Thickness Distribution of Quartz Crystal Wafer Using Open-Air Type Plasma CVM
High-Efficient Damage-Free Correction of the Thickness Distribution of Quartz Crystal Wafer Using Open-Air Type Plasma CVM
Yamamura, K. (Autor:in) / Morikawa, T. (Autor:in) / Ueda, M. (Autor:in) / Rui, F. / Lihong, Q. / Huawei, C. / Akio, O. / Hiroshi, U. / Katsuhiko, S.
01.01.2009
4 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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