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Effect of Substrate Heating in Thickness Correction of Quartz Crystal Wafer by Plasma Chemical Vaporization Machining
Effect of Substrate Heating in Thickness Correction of Quartz Crystal Wafer by Plasma Chemical Vaporization Machining
Effect of Substrate Heating in Thickness Correction of Quartz Crystal Wafer by Plasma Chemical Vaporization Machining
Ueda, M. (Autor:in) / Shibahara, M. (Autor:in) / Zettsu, N. (Autor:in) / Yamamura, K. (Autor:in) / Zhao, J. / Kunieda, M. / Yang, G. / Yuan, X.-M.
01.01.2010
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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