Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications: Fid-Bau Portal

Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Wang, G. G. / Zhang, H. Y. / Zhou, H. F. / Kuang, X. P. / Wu, Q. B. / Zuo, H. B. / Han, J. C. / Ma, H. T.

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Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Wang, G. G. / Zhang, H. Y. / Zhou, H. F. / Kuang, X. P. / Wu, Q. B. / Zuo, H. B. / Han, J. C. / Ma, H. T.

Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Wang, G. G. / Zhang, H. Y. / Zhou, H. F. / Kuang, X. P. / Wu, Q. B. / Zuo, H. B. / Han, J. C. / Ma, H. T.

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Titel:

Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications

Beteiligte:

Wang, G. G. (Autor:in) / Zhang, H. Y. (Autor:in) / Zhou, H. F. (Autor:in) / Kuang, X. P. (Autor:in) / Wu, Q. B. (Autor:in) / Zuo, H. B. (Autor:in) / Han, J. C. (Autor:in) / Ma, H. T. (Autor:in)