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Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications
Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications
Effect of ECR-assisted microwave plasma nitriding treatment on the microstructure characteristics of FCVA deposited ultra-thin ta-C films for high-density magnetic storage applications
Wang, G. G. (author) / Zhang, H. Y. (author) / Zhou, H. F. (author) / Kuang, X. P. (author) / Wu, Q. B. (author) / Zuo, H. B. (author) / Han, J. C. (author) / Ma, H. T. (author)
APPLIED SURFACE SCIENCE ; 256 ; 3024-3030
2010-01-01
7 pages
Article (Journal)
English
DDC:
621.35
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