Effects of the ultrasonic flexural vibration on the interaction between the abrasive particles; pad and sapphire substrate during chemical mechanical polishing (CMP)

Xu, W. / Lu, X. / Pan, G. et al. | British Library Online Contents | 2011

Chemical mechanical polishing (CMP) anisotropy in sapphire

Zhu, H. / Tessaroto, L. A. / Sabia, R. et al. | British Library Online Contents | 2004

Fe-Nx/C assisted chemical-mechanical polishing for improving the removal rate of sapphire

Xu, L. / Zou, C. / Shi, X. et al. | British Library Online Contents | 2015

The effect of abrasive hardness on the chemical-assisted polishing of (0001) plane sapphire

Zhu, H. / Niesz, D. E. / Greenhut, V. A. et al. | British Library Online Contents | 2005

Ultra-Precision Finishing of Micro Aspherical Surface by Ultrasonic Vibration Assisted Polishing

Suzuki, H. / Kawamori, R. / Miyabara, M. et al. | British Library Online Contents | 2005