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Temperature Facilitated ECR-Etching for Isotropic SiC Structuring
Temperature Facilitated ECR-Etching for Isotropic SiC Structuring
Temperature Facilitated ECR-Etching for Isotropic SiC Structuring
Niebelschutz, F. (author) / Stauden, T. (author) / Tonisch, K. (author) / Pezoldt, J. (author) / Bauer, A.J. / Friedrichs, P. / Krieger, M. / Pensl, G. / Rupp, R. / Seyller, T.
2010-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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