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Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas
Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas
Deposition of hydrogenated amorphous carbon nitride films by dielectric barrier discharge plasmas
APPLIED SURFACE SCIENCE ; 256 ; 6887-6892
01.01.2010
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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